IPCNY is pleased to introduce the third cohort of New Prints Artist Development Program awardees. As part of the program, the artists on view in Multilayered: New Prints 2018/Summer were invited to apply for three opportunities for further development: an artist residency, artist mentorship, and sponsored coursework.
The three selected artists are:
Morteza Khakshoor, Columbus, OH
Artist Residency at IPCNY
Morteza will complete his residency in August, in IPCNY's workshop space and EFA Robert Blackburn Printmaking Workshop. As part of his residency, he will host a "Pint n' Print" demonstration and talk on Thursday, August 16, 6-8pm.
Emma Nishimura, Toronto, ON
Emma will be paired with a mentor who will provide critical feedback, key introductions in the field, and career development advice.
Multilayered: New Prints 2018/Summer opened with artist talks by four artists on view. Danqi Cai, Emma Nishimura, David Wischer and Sajeev Vadakoottu Visweswaran discussed their techniques, inspiration, and other aspects of their wider practices.