IPCNY is pleased to introduce the fourth cohort of New Prints Artist Development Program awardees. As part of the program, the artists on view in Forms of Enclosure: New Prints 2019/Winter were invited to apply for three opportunities for further development: an artist residency, artist mentorship, and sponsored coursework.
The three selected artists are:
Allison Conley, Jersey City, NJ
ARTIST RESIDENCY AT IPCNY
Allison Conley will be in residency for the duration of Forms of Enclosure. As part of her residency, she will host a Pint n' Print demonstration and talk on Thursday, February 21, from 7–9pm. Purchase tickets for the event here.
Lucy Holtsnider, Poughkeepsie, NY
Lucy Holtsnider will be paired with a mentor who will provide critical feedback, key introductions in the field, and career development advice.